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SURFACE DAMAGE IN NANOMACHINED SILICON

PUTTICK, KE, JEYNES, C, RUDMAN, M, GEE, AE and CHAO, CL (1992) SURFACE DAMAGE IN NANOMACHINED SILICON SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 7 (2). pp. 255-259.

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Item Type: Article
Authors :
NameEmailORCID
PUTTICK, KEUNSPECIFIEDUNSPECIFIED
JEYNES, Cc.jeynes@surrey.ac.ukUNSPECIFIED
RUDMAN, MUNSPECIFIEDUNSPECIFIED
GEE, AEUNSPECIFIEDUNSPECIFIED
CHAO, CLUNSPECIFIEDUNSPECIFIED
Date : 1 February 1992
Identification Number : https://doi.org/10.1088/0268-1242/7/2/013
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Materials Science, Multidisciplinary, Physics, Condensed Matter, Engineering, Materials Science, Physics, ENGINEERING, ELECTRICAL & ELECTRONIC, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, CONDENSED MATTER
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:32
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831747

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