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MICROUNIFORMITY MEASUREMENTS OF ION-IMPLANTED SILICON

CURRENT, MI, OHNO, N, HURLEY, K, KEENAN, WA, GUITNER, TL and JEYNES, C (1993) MICROUNIFORMITY MEASUREMENTS OF ION-IMPLANTED SILICON SOLID STATE TECHNOLOGY, 36 (7). 111-&.

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Item Type: Article
Authors :
NameEmailORCID
CURRENT, MIUNSPECIFIEDUNSPECIFIED
OHNO, NUNSPECIFIEDUNSPECIFIED
HURLEY, KUNSPECIFIEDUNSPECIFIED
KEENAN, WAUNSPECIFIEDUNSPECIFIED
GUITNER, TLUNSPECIFIEDUNSPECIFIED
JEYNES, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Date : 1 July 1993
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Physics, Applied, Physics, Condensed Matter, Engineering, Physics, ENGINEERING, ELECTRICAL & ELECTRONIC, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, SCAN PATTERN, UNIFORMITY
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:32
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831736

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