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FLUORINE ENHANCED OXIDATION OF SILICON AT LOW-TEMPERATURES

KAZOR, A, JEYNES, C and BOYD, IW (1994) FLUORINE ENHANCED OXIDATION OF SILICON AT LOW-TEMPERATURES APPLIED PHYSICS LETTERS, 65 (12). pp. 1572-1574.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
KAZOR, AUNSPECIFIEDUNSPECIFIED
JEYNES, Cc.jeynes@surrey.ac.ukUNSPECIFIED
BOYD, IWUNSPECIFIEDUNSPECIFIED
Date : 19 September 1994
Identification Number : 10.1063/1.112918
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, THERMAL-OXIDATION, KINETICS, MIXTURES, NF3
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:32
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831733

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