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INFLUENCE OF ARSENIC ION-IMPLANTATION ON THE FORMATION OF TI-SILICIDES

MILOSAVLJEVIC, M, BIBIC, N, PERUSKO, D and JEYNES, C (1995) INFLUENCE OF ARSENIC ION-IMPLANTATION ON THE FORMATION OF TI-SILICIDES In: 4th European Vacuum Conference (EVC-4)1st Swedish Vacuum Meeting (SVM-1), 1994-06-13 - 1994-06-17, UPPSALA, SWEDEN.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
MILOSAVLJEVIC, MUNSPECIFIEDUNSPECIFIED
BIBIC, NUNSPECIFIEDUNSPECIFIED
PERUSKO, DUNSPECIFIEDUNSPECIFIED
JEYNES, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Date : 1 August 1995
Identification Number : 10.1016/0042-207X(95)00094-1
Contributors :
ContributionNameEmailORCID
publisherPERGAMON-ELSEVIER SCIENCE LTD, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Applied, Materials Science, Physics, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, SILICON, TISI2, SUBSTRATE
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:32
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831728

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