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OBSERVATION OF SWELLING AND SPUTTERING OF A SILICON TARGET UNDER ARGON ION IRRADIATION USING A DOUBLE MARKER TECHNIQUE

JAFRI, ZH, JEYNES, C, WEBB, RP and WILSON, IH (1989) OBSERVATION OF SWELLING AND SPUTTERING OF A SILICON TARGET UNDER ARGON ION IRRADIATION USING A DOUBLE MARKER TECHNIQUE VACUUM, 39 (11-12). pp. 1119-1121.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
JAFRI, ZHUNSPECIFIEDUNSPECIFIED
JEYNES, Cc.jeynes@surrey.ac.ukUNSPECIFIED
WEBB, RPr.webb@surrey.ac.ukUNSPECIFIED
WILSON, IHUNSPECIFIEDUNSPECIFIED
Date : 1 January 1989
Identification Number : https://doi.org/10.1016/0042-207X(89)91103-2
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Applied, Materials Science, Physics, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:31
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831714

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