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Photoreflectance characterisation of Ar+ ion etched and SiCl4 reactive ion etched silicon (100)

Murtagh, M, Lynch, SM, Kelly, PV, Hildebrant, S, Herbert, PAF, Jeynes, C and Crean, GM (1997) Photoreflectance characterisation of Ar+ ion etched and SiCl4 reactive ion etched silicon (100) In: 1st International Conference on Materials for Microelectronics, 1994-10-17 - 1994-10-19, BARCELONA, SPAIN.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Murtagh, MUNSPECIFIEDUNSPECIFIED
Lynch, SMUNSPECIFIEDUNSPECIFIED
Kelly, PVUNSPECIFIEDUNSPECIFIED
Hildebrant, SUNSPECIFIEDUNSPECIFIED
Herbert, PAFUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Crean, GMUNSPECIFIEDUNSPECIFIED
Date : 1 November 1997
Contributors :
ContributionNameEmailORCID
publisherINST MATERIALS, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Materials Science, Multidisciplinary, Metallurgy & Metallurgical Engineering, Materials Science, MATERIALS SCIENCE, MULTIDISCIPLINARY, METALLURGY & METALLURGICAL ENGINEERING, INDUCED DAMAGE, SEMICONDUCTORS, GAAS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:31
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831709

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