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Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD

Toal, SJ, Reehal, HS, Webb, SJ, Barradas, NP and Jeynes, C (1999) Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD THIN SOLID FILMS, 343. pp. 292-294.

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Item Type: Article
Authors :
NameEmailORCID
Toal, SJUNSPECIFIEDUNSPECIFIED
Reehal, HSUNSPECIFIEDUNSPECIFIED
Webb, SJUNSPECIFIEDUNSPECIFIED
Barradas, NPUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Date : 1 April 1999
Identification Number : https://doi.org/10.1016/S0040-6090(98)01585-5
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, raman scattering, x-ray diffraction, silicon carbide, ECR plasma CVD, CHEMICAL-VAPOR-DEPOSITION, CARBIDE
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:31
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831688

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