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The effects of implanted arsenic on Ti-silicide formation

Milosavljevic, M, Bibic, N, Perusko, D, Jeynes, C and Bangert, U (2000) The effects of implanted arsenic on Ti-silicide formation SOLID STATE PHENOMENA, 71. pp. 147-171.

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Item Type: Article
Authors :
NameEmailORCID
Milosavljevic, MUNSPECIFIEDUNSPECIFIED
Bibic, NUNSPECIFIEDUNSPECIFIED
Perusko, DUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Bangert, UUNSPECIFIEDUNSPECIFIED
Date : 1 January 2000
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, titanium silicides, silicidation, annealing, phase formation, interface, reaction kinetics, silicon, arsenic ion implantation, ion beam mixing, RBS analysis, electron microscopy, TITANIUM DISILICIDE FORMATION, X-RAY-DIFFRACTION, PHASE-TRANSFORMATION, THIN-FILMS, C49 TISI2, INTERFACIAL REACTIONS, METAL-METAL, SI, MULTILAYERS, STABILITY
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:31
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831678

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