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Masked ion damage and implantation for device fabrication

Blamire, MG, Kang, DJ, Burnell, G, Peng, NH, Webb, R, Jeynes, C, Yun, JH, Moon, SH and Oh, B (2002) Masked ion damage and implantation for device fabrication In: 12th International School on Vacuum, Electron and Ion Technologies, 2001-09-17 - 2001-09-21, VARNA, BULGARIA.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Blamire, MGUNSPECIFIEDUNSPECIFIED
Kang, DJUNSPECIFIEDUNSPECIFIED
Burnell, GUNSPECIFIEDUNSPECIFIED
Peng, NHUNSPECIFIEDUNSPECIFIED
Webb, Rr.webb@surrey.ac.ukUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Yun, JHUNSPECIFIEDUNSPECIFIED
Moon, SHUNSPECIFIEDUNSPECIFIED
Oh, BUNSPECIFIEDUNSPECIFIED
Date : 24 December 2002
Identification Number : https://doi.org/10.1016/S0042-207X(02)00303-2
Contributors :
ContributionNameEmailORCID
publisherPERGAMON-ELSEVIER SCIENCE LTD, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Applied, Materials Science, Physics, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, ion implantation, superconducting devices, nanotechnology, SUPERCONDUCTOR JOSEPHSON-JUNCTIONS, YBA2CU3O7-DELTA THIN-FILMS, BEAM IRRADIATION, ELECTRON
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:30
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831653

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