Masked ion damage and implantation for device fabrication
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Blamire, MG, Kang, DJ, Burnell, G, Peng, NH, Webb, R, Jeynes, C, Yun, JH, Moon, SH and Oh, B (2002) Masked ion damage and implantation for device fabrication In: 12th International School on Vacuum, Electron and Ion Technologies, 2001-09-17 - 2001-09-21, VARNA, BULGARIA.
Full text not available from this repository.| Item Type: | Conference or Workshop Item (UNSPECIFIED) | ||||||||||||||||||||||||||||||
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| Divisions : | Surrey research (other units) | ||||||||||||||||||||||||||||||
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| Date : | 24 December 2002 | ||||||||||||||||||||||||||||||
| DOI : | 10.1016/S0042-207X(02)00303-2 | ||||||||||||||||||||||||||||||
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| Uncontrolled Keywords : | Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Applied, Materials Science, Physics, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, ion implantation, superconducting devices, nanotechnology, SUPERCONDUCTOR JOSEPHSON-JUNCTIONS, YBA2CU3O7-DELTA THIN-FILMS, BEAM IRRADIATION, ELECTRON | ||||||||||||||||||||||||||||||
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| Depositing User : | Symplectic Elements | ||||||||||||||||||||||||||||||
| Date Deposited : | 17 May 2017 11:30 | ||||||||||||||||||||||||||||||
| Last Modified : | 23 Jan 2020 16:56 | ||||||||||||||||||||||||||||||
| URI: | http://epubs.surrey.ac.uk/id/eprint/831653 |
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