Masked ion damage and implantation for device fabrication

Blamire, MG, Kang, DJ, Burnell, G, Peng, NH, Webb, R, Jeynes, C, Yun, JH, Moon, SH and Oh, B (2002) Masked ion damage and implantation for device fabrication In: 12th International School on Vacuum, Electron and Ion Technologies, 2001-09-17 - 2001-09-21, VARNA, BULGARIA.

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Item Type:	Conference or Workshop Item (UNSPECIFIED)
Authors :	Name Email ORCID Blamire, MG UNSPECIFIED UNSPECIFIED Kang, DJ UNSPECIFIED UNSPECIFIED Burnell, G UNSPECIFIED UNSPECIFIED Peng, NH UNSPECIFIED UNSPECIFIED Webb, R r.webb@surrey.ac.uk UNSPECIFIED Jeynes, C c.jeynes@surrey.ac.uk UNSPECIFIED Yun, JH UNSPECIFIED UNSPECIFIED Moon, SH UNSPECIFIED UNSPECIFIED Oh, B UNSPECIFIED UNSPECIFIED
Date :	24 December 2002
Identification Number :	https://doi.org/10.1016/S0042-207X(02)00303-2
Contributors :	Contribution Name Email ORCID publisher PERGAMON-ELSEVIER SCIENCE LTD, UNSPECIFIED UNSPECIFIED
Uncontrolled Keywords :	Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Applied, Materials Science, Physics, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, ion implantation, superconducting devices, nanotechnology, SUPERCONDUCTOR JOSEPHSON-JUNCTIONS, YBA2CU3O7-DELTA THIN-FILMS, BEAM IRRADIATION, ELECTRON
Related URLs :	Author
Depositing User :	Symplectic Elements
Date Deposited :	17 May 2017 11:30
Last Modified :	17 May 2017 14:57
URI:	http://epubs.surrey.ac.uk/id/eprint/831653

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