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Comparison of boron halide, decaborane and B implants in Si from molecular dynamics simulations

Webb, RP, Winston, SH, Gwilliam, RM, Sealy, BJ, Boudreault, G, Jeynes, C and Kirkby, KJ (2003) Comparison of boron halide, decaborane and B implants in Si from molecular dynamics simulations In: 6th International Conference on Computer Simulation of Radiation Effects in Solids, 2002-06-23 - 2002-06-27, DRESDEN, GERMANY.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Webb, RPr.webb@surrey.ac.ukUNSPECIFIED
Winston, SHUNSPECIFIEDUNSPECIFIED
Gwilliam, RMUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Boudreault, GUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Kirkby, KJUNSPECIFIEDUNSPECIFIED
Date : 1 April 2003
Identification Number : https://doi.org/10.1016/S0168-583X(02)01844-X
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE BV, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, molecular implantation, silicon processing, molecular dynamics, ion beams
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:30
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831652

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