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Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS

Boudreault, G, Claudio, G, Jeynes, C, Low, R and Sealy, BJ (2004) Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 217 (1). pp. 177-182.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
Boudreault, GUNSPECIFIEDUNSPECIFIED
Claudio, GUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Low, RUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Date : 1 March 2004
Identification Number : https://doi.org/10.1016/j.nimb.2003.09.033
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, SURFACE-ANALYSIS, ICP-IDMS, SILICON, SI, CERTIFICATION, INAA
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:30
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831648

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