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Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method

Martinez, FL, Ruiz-Merino, R, del Prado, A, San Andres, E, Martil, I, Gonzalez-Diaz, G, Jeynes, C, Barradas, NP, Wang, L and Reehal, HS (2004) Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method In: 8th European Vacuum Congress (EVC-8)/2nd Annual Conference of the German-Vacuum-Society (DVG), 2003-06-23 - 2003-06-26, Berlin, GERMANY.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Martinez, FLUNSPECIFIEDUNSPECIFIED
Ruiz-Merino, RUNSPECIFIEDUNSPECIFIED
del Prado, AUNSPECIFIEDUNSPECIFIED
San Andres, EUNSPECIFIEDUNSPECIFIED
Martil, IUNSPECIFIEDUNSPECIFIED
Gonzalez-Diaz, GUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Barradas, NPUNSPECIFIEDUNSPECIFIED
Wang, LUNSPECIFIEDUNSPECIFIED
Reehal, HSUNSPECIFIEDUNSPECIFIED
Date : 1 July 2004
Identification Number : 10.1016/j.tsf.2003.12.084
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE SA, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, silicon nitride, hydrogen, bonding energy, network bond reactions, FREE-ENERGY MODEL, SI-SIO2 INTERFACES, ALLOYS, SI
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:30
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831647

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