University of Surrey

Test tubes in the lab Research in the ATI Dance Research

Evaluation of the Boron activation and depth distribution using BBr2+ implants

Winston, SH, Gwilliam, RM, Sealy, BJ, Boudreault, G, Jeynes, C, Webb, RP and Kirkby, KJ (2003) Evaluation of the Boron activation and depth distribution using BBr2+ implants In: 14th International Conference on Ion Implantation Technology, 2002-09-18 - 2002-09-27, TAOS, NM.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Winston, SHUNSPECIFIEDUNSPECIFIED
Gwilliam, RMUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Boudreault, GUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Webb, RPr.webb@surrey.ac.ukUNSPECIFIED
Kirkby, KJUNSPECIFIEDUNSPECIFIED
Date : 1 January 2003
Contributors :
ContributionNameEmailORCID
UNSPECIFIEDBrown, BUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDAlford, TLUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDNastasi, MUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDVella, MCUNSPECIFIEDUNSPECIFIED
publisherIEEE, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Manufacturing, Engineering, Electrical & Electronic, Physics, Applied, Physics, Condensed Matter, Engineering, Physics, boron, silicon, B+, BF2+, BBr2+, electrical activation, SILICON
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:30
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831643

Actions (login required)

View Item View Item

Downloads

Downloads per month over past year


Information about this web site

© The University of Surrey, Guildford, Surrey, GU2 7XH, United Kingdom.
+44 (0)1483 300800