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Comparison of elemental boron and boron halide implants into silicon

Sharp, JA, Gwilliam, RM, Sealy, BJ, Jeynes, C, Hamilton, JJ and Kirkby, KJ (2005) Comparison of elemental boron and boron halide implants into silicon In: 15th International Conference on Ion Implantation Technology, 2004-10-25 - 2004-10-27, Taipei, TAIWAN.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Sharp, JAUNSPECIFIEDUNSPECIFIED
Gwilliam, RMUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Hamilton, JJUNSPECIFIEDUNSPECIFIED
Kirkby, KJUNSPECIFIEDUNSPECIFIED
Date : 1 August 2005
Identification Number : 10.1016/j.nimb.2005.04.084
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE BV, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, semiconductors, boron, shallow-junctions, activation, RBS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:30
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831639

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