Comparison of elemental boron and boron halide implants into silicon
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Sharp, JA, Gwilliam, RM, Sealy, BJ, Jeynes, C, Hamilton, JJ and Kirkby, KJ (2005) Comparison of elemental boron and boron halide implants into silicon In: 15th International Conference on Ion Implantation Technology, 2004-10-25 - 2004-10-27, Taipei, TAIWAN.
Full text not available from this repository.| Item Type: | Conference or Workshop Item (UNSPECIFIED) | |||||||||||||||||||||
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| Date : | 1 August 2005 | |||||||||||||||||||||
| Identification Number : | 10.1016/j.nimb.2005.04.084 | |||||||||||||||||||||
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| Uncontrolled Keywords : | Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, semiconductors, boron, shallow-junctions, activation, RBS | |||||||||||||||||||||
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| Depositing User : | Symplectic Elements | |||||||||||||||||||||
| Date Deposited : | 17 May 2017 11:30 | |||||||||||||||||||||
| Last Modified : | 17 May 2017 14:57 | |||||||||||||||||||||
| URI: | http://epubs.surrey.ac.uk/id/eprint/831639 |
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