Comparison of elemental boron and boron halide implants into silicon
Tools
Tools
Tools
Sharp, JA, Gwilliam, RM, Sealy, BJ, Jeynes, C, Hamilton, JJ and Kirkby, KJ (2005) Comparison of elemental boron and boron halide implants into silicon In: 15th International Conference on Ion Implantation Technology, 2004-10-25 - 2004-10-27, Taipei, TAIWAN.
Full text not available from this repository.| Item Type: | Conference or Workshop Item (UNSPECIFIED) | |||||||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Authors : |
|
|||||||||||||||||||||
| Date : | 1 August 2005 | |||||||||||||||||||||
| DOI : | 10.1016/j.nimb.2005.04.084 | |||||||||||||||||||||
| Contributors : |
|
|||||||||||||||||||||
| Uncontrolled Keywords : | Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, semiconductors, boron, shallow-junctions, activation, RBS | |||||||||||||||||||||
| Related URLs : | ||||||||||||||||||||||
| Depositing User : | Symplectic Elements | |||||||||||||||||||||
| Date Deposited : | 17 May 2017 11:30 | |||||||||||||||||||||
| Last Modified : | 16 Jan 2019 18:16 | |||||||||||||||||||||
| URI: | http://epubs.surrey.ac.uk/id/eprint/831639 |
Actions (login required)
 |
View Item |
Downloads
Downloads per month over past year