Comparison of elemental boron and boron halide implants into silicon

Sharp, JA, Gwilliam, RM, Sealy, BJ, Jeynes, C, Hamilton, JJ and Kirkby, KJ (2005) Comparison of elemental boron and boron halide implants into silicon In: 15th International Conference on Ion Implantation Technology, 2004-10-25 - 2004-10-27, Taipei, TAIWAN.

Full text not available from this repository.

Item Type:	Conference or Workshop Item (UNSPECIFIED)
Authors :	Name Email ORCID Sharp, JA UNSPECIFIED UNSPECIFIED Gwilliam, RM UNSPECIFIED UNSPECIFIED Sealy, BJ UNSPECIFIED UNSPECIFIED Jeynes, C c.jeynes@surrey.ac.uk UNSPECIFIED Hamilton, JJ UNSPECIFIED UNSPECIFIED Kirkby, KJ UNSPECIFIED UNSPECIFIED
Date :	1 August 2005
Identification Number :	https://doi.org/10.1016/j.nimb.2005.04.084
Contributors :	Contribution Name Email ORCID publisher ELSEVIER SCIENCE BV, UNSPECIFIED UNSPECIFIED
Uncontrolled Keywords :	Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, semiconductors, boron, shallow-junctions, activation, RBS
Related URLs :	Author
Depositing User :	Symplectic Elements
Date Deposited :	17 May 2017 11:30
Last Modified :	17 May 2017 14:57
URI:	http://epubs.surrey.ac.uk/id/eprint/831639

Actions (login required)

View Item

Downloads