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Evaluation of BBr2+ and B++Br+ implants in silicon

Sharp, JA, Gwilliam, RM, Sealy, BJ, Jeynes, C, Hamilton, JJ and Kirkby, KJ (2005) Evaluation of BBr2+ and B++Br+ implants in silicon In: Symposium on Materials Science and Device Issues for Futrue Si-Based Technologies held at the 2005 EMRS Meeting, 2005-05-31 - 2005-06-03, Strasbourg, FRANCE.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Sharp, JAUNSPECIFIEDUNSPECIFIED
Gwilliam, RMUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Hamilton, JJUNSPECIFIEDUNSPECIFIED
Kirkby, KJUNSPECIFIEDUNSPECIFIED
Date : 5 December 2005
Identification Number : 10.1016/j.mseb.2005.08.065
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE SA, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Condensed Matter, Materials Science, Physics, boron, Rutherford backscattering spectroscopy, silicon, Hall effect, BORON, FLUORINE, SI
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:30
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831638

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