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Ion beam deposited carbon nitride films: Characterization and identification of chemical sputtering

Hammer, P, Baker, MA, Lenardi, C and Gissler, W (1996) Ion beam deposited carbon nitride films: Characterization and identification of chemical sputtering In: 23rd International Conference on Metallurgical Coatings and Thin Films, 1996-04-22 - 1996-04-26, SAN DIEGO, CA.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Hammer, PUNSPECIFIEDUNSPECIFIED
Baker, MAm.baker@surrey.ac.ukUNSPECIFIED
Lenardi, CUNSPECIFIEDUNSPECIFIED
Gissler, WUNSPECIFIEDUNSPECIFIED
Date : 15 December 1996
Identification Number : https://doi.org/10.1016/S0040-6090(96)09061-X
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE SA, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, carbon nitride, chemical sputtering, nanoindentation, X-ray photoelectron spectroscopy, THIN-FILMS, BETA-C3N4, DIAMOND
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:29
Last Modified : 17 May 2017 14:56
URI: http://epubs.surrey.ac.uk/id/eprint/831533

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