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Low-temperature sputter deposition and characterisation of carbon nitride films

Baker, MA, Hammer, P, Lenardi, C, Haupt, J and Gissler, W (1997) Low-temperature sputter deposition and characterisation of carbon nitride films In: 5th International Conference on Plasma Surface Engineering, 1996-09-09 - 1996-09-13, GARMISCH PARTENKI, GERMANY.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Baker, MAm.baker@surrey.ac.ukUNSPECIFIED
Hammer, PUNSPECIFIEDUNSPECIFIED
Lenardi, CUNSPECIFIEDUNSPECIFIED
Haupt, JUNSPECIFIEDUNSPECIFIED
Gissler, WUNSPECIFIEDUNSPECIFIED
Date : 1 December 1997
Identification Number : 10.1016/S0257-8972(97)00187-4
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE SA, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Coatings & Films, Physics, Applied, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, PHYSICS, APPLIED, carbon nitride, characterisation, sputter deposition, thin film, THIN-FILMS, GRAPHITE
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:29
Last Modified : 17 May 2017 14:56
URI: http://epubs.surrey.ac.uk/id/eprint/831526

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