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A comparison of in situ polishing and ion beam sputtering as surface preparation methods for XPS analysis of PVD coatings

Baker, MA, Greaves, SJ, Wendler, E and Fox, V (2000) A comparison of in situ polishing and ion beam sputtering as surface preparation methods for XPS analysis of PVD coatings In: 27th International Conference on Metallurgical Coatings and Thin Films, 2000-04-10 - 2000-04-14, SAN DIEGO, CALIFORNIA.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Baker, MAm.baker@surrey.ac.ukUNSPECIFIED
Greaves, SJUNSPECIFIEDUNSPECIFIED
Wendler, EUNSPECIFIEDUNSPECIFIED
Fox, VUNSPECIFIEDUNSPECIFIED
Date : 1 December 2000
Identification Number : https://doi.org/10.1016/S0040-6090(00)01272-4
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE SA, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, XPS, in situ polishing, sputtering, PVD coatings, RAY PHOTOELECTRON-SPECTROSCOPY, AUGER-ELECTRON SPECTROSCOPY, BACKSCATTERING, FILMS, TIN
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:27
Last Modified : 17 May 2017 14:56
URI: http://epubs.surrey.ac.uk/id/eprint/831437

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