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Spatially correlated erbium and Si nanocrystals in coimplanted SiO2 after a single high temperature anneal

Crowe, IF, Kashtiban, RJ, Sherliker, B, Bangert, U, Halsall, MP, Knights, AP and Gwilliam, RM (2010) Spatially correlated erbium and Si nanocrystals in coimplanted SiO2 after a single high temperature anneal JOURNAL OF APPLIED PHYSICS, 107 (4), ARTN 04431.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
Crowe, IFUNSPECIFIEDUNSPECIFIED
Kashtiban, RJUNSPECIFIEDUNSPECIFIED
Sherliker, BUNSPECIFIEDUNSPECIFIED
Bangert, UUNSPECIFIEDUNSPECIFIED
Halsall, MPUNSPECIFIEDUNSPECIFIED
Knights, APUNSPECIFIEDUNSPECIFIED
Gwilliam, RMr.gwilliam@surrey.ac.ukUNSPECIFIED
Date : 15 February 2010
Identification Number : 10.1063/1.3294645
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, annealing, electron energy loss spectra, erbium, nanostructured materials, photoluminescence, scanning-transmission electron microscopy, silicon, silicon compounds, SILICON NANOCRYSTALS, OPTICAL GAIN, AMORPHOUS-SILICON, ENERGY-TRANSFER, DOPED SILICON, MU-M, ER, PHOTOLUMINESCENCE, LUMINESCENCE, IONS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:18
Last Modified : 17 May 2017 14:55
URI: http://epubs.surrey.ac.uk/id/eprint/830838

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