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Junction Leakage Analysis of Vacancy Engineered Ultra-Shallow p-type Layers

Smith, AJ, Antwis, LD, Yeong, SH, Knights, AP, Colombeau, B, Sealy, BJ and Gwilliam, RM (2008) Junction Leakage Analysis of Vacancy Engineered Ultra-Shallow p-type Layers In: 17th International Conference on Ion Implantation Technology, 2008-06-08 - 2008-06-13, Monterey, CA.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Smith, AJa.j.smith@surrey.ac.ukUNSPECIFIED
Antwis, LDUNSPECIFIEDUNSPECIFIED
Yeong, SHUNSPECIFIEDUNSPECIFIED
Knights, APUNSPECIFIEDUNSPECIFIED
Colombeau, BUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Gwilliam, RMr.gwilliam@surrey.ac.ukUNSPECIFIED
Date : 1 January 2008
Contributors :
ContributionNameEmailORCID
UNSPECIFIEDSeebauer, EGUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDKondratenko, YVUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDFelch, SBUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDJain, AUNSPECIFIEDUNSPECIFIED
publisherAMER INST PHYSICS, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Materials Science, Multidisciplinary, Physics, Applied, Engineering, Materials Science, Physics, Vacancy Engineering, Leakage Measurements, Boron
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:08
Last Modified : 17 May 2017 14:54
URI: http://epubs.surrey.ac.uk/id/eprint/830182

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