New developments on the Surrey microbeam applications to lithography

Mistry, P, Gornez-Morilla, I, Grime, GW, Webb, R, Jeynes, C, Gwilliam, R, Cansell, A, Merchant, M and Kirkby, KJ (2005) New developments on the Surrey microbeam applications to lithography In: 9th International Conference on Nuclear Microprobe Technology and Applications, 2004-09-13 - 2004-09-17, Cavtat, CROATIA.

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Item Type:	Conference or Workshop Item (UNSPECIFIED)
Authors :	Name Email ORCID Mistry, P UNSPECIFIED UNSPECIFIED Gornez-Morilla, I UNSPECIFIED UNSPECIFIED Grime, GW g.grime@surrey.ac.uk UNSPECIFIED Webb, R r.webb@surrey.ac.uk UNSPECIFIED Jeynes, C c.jeynes@surrey.ac.uk UNSPECIFIED Gwilliam, R UNSPECIFIED UNSPECIFIED Cansell, A UNSPECIFIED UNSPECIFIED Merchant, M m.merchant@surrey.ac.uk UNSPECIFIED Kirkby, KJ UNSPECIFIED UNSPECIFIED
Date :	1 April 2005
Identification Number :	https://doi.org/10.1016/j.nimb.2005.01.095
Contributors :	Contribution Name Email ORCID publisher ELSEVIER SCIENCE BV, UNSPECIFIED UNSPECIFIED
Uncontrolled Keywords :	Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, proton beam lithography, GaAs, PMMA, ION-BEAM LITHOGRAPHY
Related URLs :	Author
Depositing User :	Symplectic Elements
Date Deposited :	17 May 2017 11:04
Last Modified :	17 May 2017 14:54
URI:	http://epubs.surrey.ac.uk/id/eprint/829919

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