New developments on the Surrey microbeam applications to lithography
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Mistry, P, Gornez-Morilla, I, Grime, GW, Webb, R, Jeynes, C, Gwilliam, R, Cansell, A, Merchant, M and Kirkby, KJ (2005) New developments on the Surrey microbeam applications to lithography In: 9th International Conference on Nuclear Microprobe Technology and Applications, 2004-09-13 - 2004-09-17, Cavtat, CROATIA.
Full text not available from this repository.| Item Type: | Conference or Workshop Item (UNSPECIFIED) | ||||||||||||||||||||||||||||||
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| Divisions : | Surrey research (other units) | ||||||||||||||||||||||||||||||
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| Date : | 1 April 2005 | ||||||||||||||||||||||||||||||
| DOI : | 10.1016/j.nimb.2005.01.095 | ||||||||||||||||||||||||||||||
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| Uncontrolled Keywords : | Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, proton beam lithography, GaAs, PMMA, ION-BEAM LITHOGRAPHY | ||||||||||||||||||||||||||||||
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| Depositing User : | Symplectic Elements | ||||||||||||||||||||||||||||||
| Date Deposited : | 17 May 2017 11:04 | ||||||||||||||||||||||||||||||
| Last Modified : | 23 Jan 2020 16:26 | ||||||||||||||||||||||||||||||
| URI: | http://epubs.surrey.ac.uk/id/eprint/829919 |
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