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Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials

Emerson, NG, Gwilliam, RM and Sealy, BJ (2001) Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials JOURNAL OF ELECTRONIC MATERIALS, 30 (2). L5-L7.

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Item Type: Article
Authors :
NameEmailORCID
Emerson, NGn.emerson@surrey.ac.ukUNSPECIFIED
Gwilliam, RMUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Date : 1 February 2001
Identification Number : https://doi.org/10.1007/s11664-001-0109-9
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Materials Science, Multidisciplinary, Physics, Applied, Engineering, Materials Science, Physics, ENGINEERING, ELECTRICAL & ELECTRONIC, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, ion implantation, amorphous semiconductors, materials synthesis, electrical properties, IMPLANTATION
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:01
Last Modified : 17 May 2017 14:53
URI: http://epubs.surrey.ac.uk/id/eprint/829687

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