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Laser annealing of sputtered silicon for wafer-bonding applications

Hurley, RE, Gamble, HS, Jin, M-H, Armstrong, BM, Ghita, M, McCullough, RW, Adikaari, AADT, Henley, SJ and Silva, SRP (2007) Laser annealing of sputtered silicon for wafer-bonding applications In: 14th International School on Condensed Matter Physics, 2006-09-17 - 2006-09-22, Varna, BULGARIA.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Hurley, REUNSPECIFIEDUNSPECIFIED
Gamble, HSUNSPECIFIEDUNSPECIFIED
Jin, M-HUNSPECIFIEDUNSPECIFIED
Armstrong, BMUNSPECIFIEDUNSPECIFIED
Ghita, MUNSPECIFIEDUNSPECIFIED
McCullough, RWUNSPECIFIEDUNSPECIFIED
Adikaari, AADTUNSPECIFIEDUNSPECIFIED
Henley, SJs.henley@surrey.ac.ukUNSPECIFIED
Silva, SRPs.silva@surrey.ac.ukUNSPECIFIED
Date : 1 January 2007
Contributors :
ContributionNameEmailORCID
publisherNATL INST OPTOELECTRONICS, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Optics, Physics, Applied, Materials Science, Physics, MATERIALS SCIENCE, MULTIDISCIPLINARY, OPTICS, PHYSICS, APPLIED, silicon, sputter, laser anneal, excimer, wafer bonding, layer transfer, POLYCRYSTALLINE SILICON, CRYSTALLINE SILICON, AMORPHOUS-SILICON, ARGON, FILMS, SI, TECHNOLOGY, ROUGHNESS, SURFACES, DAMAGE
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 10:57
Last Modified : 17 May 2017 14:53
URI: http://epubs.surrey.ac.uk/id/eprint/829455

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