Deactivation of ultra shallow B and BF2 profiles after non-melt laser annealing

Sharp, JA, Cowern, NEB, Webb, RP, Giubertoni, D, Gennaro, S, Bersani, M, Foad, MA and Kirkby, KJ (2006) Deactivation of ultra shallow B and BF2 profiles after non-melt laser annealing In: Symposium on Sub Second Rapid Thermal Processing for Device Fabrication held at the 2006 MRS Spring Meeting, 2006-04-18 - 2006-04-19, San Francisco, CA.

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Item Type:	Conference or Workshop Item (UNSPECIFIED)
Divisions :	Surrey research (other units)
Authors :	Name Email ORCID Sharp, JA Cowern, NEB Webb, RP r.webb@surrey.ac.uk Giubertoni, D Gennaro, S Bersani, M Foad, MA Kirkby, KJ k.kirkby@surrey.ac.uk
Date :	1 January 2006
Contributors :	Contribution Name Email ORCID Pawlak, BJ Jones, KS Felch, SB Hane, M publisher MATERIALS RESEARCH SOCIETY,
Uncontrolled Keywords :	Science & Technology, Technology, Materials Science, Multidisciplinary, Materials Science, Characterization & Testing, Materials Science, JUNCTIONS, ACTIVATION, DIFFUSION, BORON
Related URLs :	Author
Depositing User :	Symplectic Elements
Date Deposited :	17 May 2017 10:56
Last Modified :	23 Jan 2020 16:16
URI:	http://epubs.surrey.ac.uk/id/eprint/829390

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