Deactivation of ultra shallow B and BF2 profiles after non-melt laser annealing
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Sharp, JA, Cowern, NEB, Webb, RP, Giubertoni, D, Gennaro, S, Bersani, M, Foad, MA and Kirkby, KJ (2006) Deactivation of ultra shallow B and BF2 profiles after non-melt laser annealing In: Symposium on Sub Second Rapid Thermal Processing for Device Fabrication held at the 2006 MRS Spring Meeting, 2006-04-18 - 2006-04-19, San Francisco, CA.
Full text not available from this repository.Item Type: | Conference or Workshop Item (UNSPECIFIED) | |||||||||||||||||||||||||||
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Divisions : | Surrey research (other units) | |||||||||||||||||||||||||||
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Date : | 1 January 2006 | |||||||||||||||||||||||||||
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Uncontrolled Keywords : | Science & Technology, Technology, Materials Science, Multidisciplinary, Materials Science, Characterization & Testing, Materials Science, JUNCTIONS, ACTIVATION, DIFFUSION, BORON | |||||||||||||||||||||||||||
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Depositing User : | Symplectic Elements | |||||||||||||||||||||||||||
Date Deposited : | 17 May 2017 10:56 | |||||||||||||||||||||||||||
Last Modified : | 23 Jan 2020 16:16 | |||||||||||||||||||||||||||
URI: | http://epubs.surrey.ac.uk/id/eprint/829390 |
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