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Deactivation of ultra shallow B and BF2 profiles after non-melt laser annealing

Sharp, JA, Cowern, NEB, Webb, RP, Giubertoni, D, Gennaro, S, Bersani, M, Foad, MA and Kirkby, KJ (2006) Deactivation of ultra shallow B and BF2 profiles after non-melt laser annealing In: Symposium on Sub Second Rapid Thermal Processing for Device Fabrication held at the 2006 MRS Spring Meeting, 2006-04-18 - 2006-04-19, San Francisco, CA.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Sharp, JA
Cowern, NEB
Webb, RPr.webb@surrey.ac.uk
Giubertoni, D
Gennaro, S
Bersani, M
Foad, MA
Kirkby, KJk.kirkby@surrey.ac.uk
Date : 1 January 2006
Contributors :
ContributionNameEmailORCID
Pawlak, BJ
Jones, KS
Felch, SB
Hane, M
publisherMATERIALS RESEARCH SOCIETY,
Uncontrolled Keywords : Science & Technology, Technology, Materials Science, Multidisciplinary, Materials Science, Characterization & Testing, Materials Science, JUNCTIONS, ACTIVATION, DIFFUSION, BORON
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 10:56
Last Modified : 17 May 2017 14:53
URI: http://epubs.surrey.ac.uk/id/eprint/829390

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