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A Comparative Study of Interaction of End of Range (EOR) Defect Band with Upper Buried Oxide (BOX) Interface for B and BF(2) Implants in SOI and Bulk Silicon with Pre-Amorphizing Implant

Kah, M, Smith, AJ, Hamilton, JJ, Yeong, SH, Columbeau, B, Gwilliam, R, Webb, RP and Kirkby, KJ (2008) A Comparative Study of Interaction of End of Range (EOR) Defect Band with Upper Buried Oxide (BOX) Interface for B and BF(2) Implants in SOI and Bulk Silicon with Pre-Amorphizing Implant In: 17th International Conference on Ion Implantation Technology, 2008-06-08 - 2008-06-13, Monterey, CA.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Kah, MUNSPECIFIEDUNSPECIFIED
Smith, AJa.j.smith@surrey.ac.ukUNSPECIFIED
Hamilton, JJUNSPECIFIEDUNSPECIFIED
Yeong, SHUNSPECIFIEDUNSPECIFIED
Columbeau, BUNSPECIFIEDUNSPECIFIED
Gwilliam, Rr.gwilliam@surrey.ac.ukUNSPECIFIED
Webb, RPr.webb@surrey.ac.ukUNSPECIFIED
Kirkby, KJk.kirkby@surrey.ac.ukUNSPECIFIED
Date : 1 January 2008
Contributors :
ContributionNameEmailORCID
UNSPECIFIEDSeebauer, EGUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDKondratenko, YVUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDFelch, SBUNSPECIFIEDUNSPECIFIED
UNSPECIFIEDJain, AUNSPECIFIEDUNSPECIFIED
publisherAMER INST PHYSICS, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Materials Science, Multidisciplinary, Physics, Applied, Engineering, Materials Science, Physics, B, BF(2), pre-amorphization, silicon-on-insulator, BORON, FLUORINE, SI, DIFFUSION
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 10:56
Last Modified : 17 May 2017 14:53
URI: http://epubs.surrey.ac.uk/id/eprint/829385

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