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Development of nanotopography during SIMS characterization of thin films of Ge1-xSnx alloy

Secchi, M, Demenev, E, Colaux, JL, Giubertoni, D, Dell'Anna, R, Iacob, E, Gwilliam, M, Jeynes, C and Bersani, M (2015) Development of nanotopography during SIMS characterization of thin films of Ge1-xSnx alloy APPLIED SURFACE SCIENCE, 356. pp. 422-428.

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Item Type: Article
Authors :
AuthorsEmailORCID
Secchi, MUNSPECIFIEDUNSPECIFIED
Demenev, EUNSPECIFIEDUNSPECIFIED
Colaux, JLUNSPECIFIEDUNSPECIFIED
Giubertoni, DUNSPECIFIEDUNSPECIFIED
Dell'Anna, RUNSPECIFIEDUNSPECIFIED
Iacob, EUNSPECIFIEDUNSPECIFIED
Gwilliam, MUNSPECIFIEDUNSPECIFIED
Jeynes, CUNSPECIFIEDUNSPECIFIED
Bersani, MUNSPECIFIEDUNSPECIFIED
Date : 30 November 2015
Identification Number : https://doi.org/10.1016/j.apsusc.2015.08.083
Uncontrolled Keywords : Science & Technology, Physical Sciences, Technology, Chemistry, Physical, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Chemistry, Materials Science, Physics, SIMS protocol, Ge1-xSnx, Nanotopography, Ripple, ION-BOMBARDMENT, SPECTROMETRY, TOPOGRAPHY, ROUGHNESS, GERMANIUM, SURFACES, CS+
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 28 Mar 2017 10:57
Last Modified : 28 Mar 2017 10:57
URI: http://epubs.surrey.ac.uk/id/eprint/809686

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