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Data for Paper: The Impact of Substrate Bias on a Remote Plasma Sputter Coating Process for Conformal Coverage of Trenches and 3D Structures

Brown, Hayley (2015) Data for Paper: The Impact of Substrate Bias on a Remote Plasma Sputter Coating Process for Conformal Coverage of Trenches and 3D Structures [Dataset]

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Item Type: Dataset
Divisions : Faculty of Engineering and Physical Sciences > Mechanical Engineering Sciences
Principal Investigator :
Principal InvestigatorEmail
Brown, Hayley Lh.l.brown@surrey.ac.uk
Description : Raw Data Files for Paper: The Impact of Substrate Bias on a Remote Plasma Sputter Coating Process for Conformal Coverage of Trenches and 3D Structures
Dataset Creators :
AuthorsEmailORCID
Brown, Hayleyh.l.brown@surrey.ac.ukUNSPECIFIED
Publication Year of Data : 2015
Publication Date of Paper : 2015
Funder : EPSRC, Plasma Quest Ltd
Identification Number : 10.15126/surreydata.00807911
Grant Title : n/a
Access Statement : No Restrictions
Copyright License : CC-BY
Data Access Contact :
Data Access ContactEmail
UNSPECIFIEDresearchdata@surrey.ac.uk
External Data Location : n/a
Project Title : The Properties and Performance of Moisture/Oxygen Barrier Layers Deposited by Remote Plasma Sputtering
Data Format : Graphs, SEM, EDX
Contributors :
ContributionNameEmailORCID
AuthorThornley, Sarahsarah.thornley@plasmaquest.co.ukUNSPECIFIED
AuthorWakeham, Stevesteve.wakeham@plasmaquest.co.ukUNSPECIFIED
AuthorMike, Thwaitesmike.thwaites@plasmaquest.co.ukUNSPECIFIED
AuthorCurry, Richard Jr.j.curry@surrey.ac.ukUNSPECIFIED
AuthorBaker, Mark Am.baker@surrey.ac.ukUNSPECIFIED
Version : 1
Depositing User : Hayley Brown
Date Deposited : 15 Jun 2015 11:23
Last Modified : 15 Jun 2015 11:23
URI: http://epubs.surrey.ac.uk/id/eprint/807921

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