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Certified ion implantation fluence by high accuracy RBS

Colaux, JL, Jeynes, C, Heasman, KC and Gwilliam, RM (2015) Certified ion implantation fluence by high accuracy RBS ANALYST, 140 (9). pp. 3251-3261.

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Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
AuthorsEmailORCID
Colaux, JLUNSPECIFIEDUNSPECIFIED
Jeynes, CUNSPECIFIEDUNSPECIFIED
Heasman, KCUNSPECIFIEDUNSPECIFIED
Gwilliam, RMUNSPECIFIEDUNSPECIFIED
Date : 1 January 2015
Identification Number : 10.1039/c4an02316a
Uncontrolled Keywords : Science & Technology, Physical Sciences, Chemistry, Analytical, Chemistry, RUTHERFORD BACKSCATTERING SPECTROMETRY, SUPERCONDUCTING MGB2, ANNEALING ANALYSIS, SURFACE-ANALYSIS, THIN-FILMS, SILICON, IBA, CALIBRATION, CERTIFICATION, SCATTERING
Related URLs :
Additional Information : © The Royal Society of Chemistry 2015
Depositing User : Symplectic Elements
Date Deposited : 21 Apr 2015 15:49
Last Modified : 11 Feb 2016 02:08
URI: http://epubs.surrey.ac.uk/id/eprint/807399

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