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Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectrics

Lazzeri, P, Oehrlein, GS, Stueber, GJ, McGowan, R, Busch, E, Pederzoli, S, Jeynes, C, Bersani, M and Anderle, M (2008) Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectrics In: 28th Dry Process Symposium (DPS), 2006-11-29 - 2006-11-30, Nagoya, JAPAN.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Lazzeri, PUNSPECIFIEDUNSPECIFIED
Oehrlein, GSUNSPECIFIEDUNSPECIFIED
Stueber, GJUNSPECIFIEDUNSPECIFIED
McGowan, RUNSPECIFIEDUNSPECIFIED
Busch, EUNSPECIFIEDUNSPECIFIED
Pederzoli, SUNSPECIFIEDUNSPECIFIED
Jeynes, CUNSPECIFIEDUNSPECIFIED
Bersani, MUNSPECIFIEDUNSPECIFIED
Anderle, MUNSPECIFIEDUNSPECIFIED
Date : 1 April 2008
Identification Number : 10.1016/j.tsf.2007.08.043
Contributors :
ContributionNameEmailORCID
http://www.loc.gov/loc.terms/relators/PBLELSEVIER SCIENCE SA, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, organo-silicate, dielectiic, low-k, stripping, ashing, plasma, damage, ToF-SIMS, FLUOROCARBON PLASMAS, LOW-K, FILMS, SURFACE, ULK
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 28 Mar 2017 13:14
Last Modified : 31 Oct 2017 17:07
URI: http://epubs.surrey.ac.uk/id/eprint/806543

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