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Critical review of the current status of thickness measurements for ultrathin SiO on Si Part V: Results of a CCQM pilot study

Seah, MP, Spencer, SJ, Bensebaa, F, Vickridge, I, Danzebrink, H, Krumrey, M, Gross, T, Oesterle, W, Wendler, E, Rheinländer, B, Azuma, Y, Kojima, I, Suzuki, N, Suzuki, M, Tanuma, S, Moon, DW, Lee, HJ, Cho, HM, Chen, HY, Wee, ATS, Osipowicz, T, Pan, JS, Jordaan, WA, Hauert, R, Klotz, U, Van Der Marel, C, Verheijen, M, Tamminga, Y, Jeynes, C, Bailey, P, Biswas, S, Falke, U, Nguyen, NV, Chandler-Horowitz, D, Ehrstein, JR, Muller, D and Dura, JA (2004) Critical review of the current status of thickness measurements for ultrathin SiO on Si Part V: Results of a CCQM pilot study Surface and Interface Analysis, 36 (9). pp. 1269-1303.

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Abstract

A study was carried out for the measurement of ultrathin SiO on (100) and (111) orientation silicon wafer in the thickness range 1.5-8 nm. XPS, medium-energy ion scattering spectrometry (MEIS), nuclear reaction analysis (NRA), RBS, elastic backscattering spectrometry (EBS), SIMS, ellipsometry, gazing-incidence x-ray reflectometry (GIXRR), neutron reflectometry and transmission electron microscopy (TEM) were used for the measurements. Water and carbonaceous contamination about 1 nm were observed by ellipsometry and adsorbed oxygen mainly from water at thickness of 0.5 nm were seen by MEIS, NRA, RBS and GIXRR. The different uncertainty of the techniques for the scaling constant were also discussed.

Item Type: Article
Authors :
AuthorsEmailORCID
Seah, MPUNSPECIFIEDUNSPECIFIED
Spencer, SJUNSPECIFIEDUNSPECIFIED
Bensebaa, FUNSPECIFIEDUNSPECIFIED
Vickridge, IUNSPECIFIEDUNSPECIFIED
Danzebrink, HUNSPECIFIEDUNSPECIFIED
Krumrey, MUNSPECIFIEDUNSPECIFIED
Gross, TUNSPECIFIEDUNSPECIFIED
Oesterle, WUNSPECIFIEDUNSPECIFIED
Wendler, EUNSPECIFIEDUNSPECIFIED
Rheinländer, BUNSPECIFIEDUNSPECIFIED
Azuma, YUNSPECIFIEDUNSPECIFIED
Kojima, IUNSPECIFIEDUNSPECIFIED
Suzuki, NUNSPECIFIEDUNSPECIFIED
Suzuki, MUNSPECIFIEDUNSPECIFIED
Tanuma, SUNSPECIFIEDUNSPECIFIED
Moon, DWUNSPECIFIEDUNSPECIFIED
Lee, HJUNSPECIFIEDUNSPECIFIED
Cho, HMUNSPECIFIEDUNSPECIFIED
Chen, HYUNSPECIFIEDUNSPECIFIED
Wee, ATSUNSPECIFIEDUNSPECIFIED
Osipowicz, TUNSPECIFIEDUNSPECIFIED
Pan, JSUNSPECIFIEDUNSPECIFIED
Jordaan, WAUNSPECIFIEDUNSPECIFIED
Hauert, RUNSPECIFIEDUNSPECIFIED
Klotz, UUNSPECIFIEDUNSPECIFIED
Van Der Marel, CUNSPECIFIEDUNSPECIFIED
Verheijen, MUNSPECIFIEDUNSPECIFIED
Tamminga, YUNSPECIFIEDUNSPECIFIED
Jeynes, CUNSPECIFIEDUNSPECIFIED
Bailey, PUNSPECIFIEDUNSPECIFIED
Biswas, SUNSPECIFIEDUNSPECIFIED
Falke, UUNSPECIFIEDUNSPECIFIED
Nguyen, NVUNSPECIFIEDUNSPECIFIED
Chandler-Horowitz, DUNSPECIFIEDUNSPECIFIED
Ehrstein, JRUNSPECIFIEDUNSPECIFIED
Muller, DUNSPECIFIEDUNSPECIFIED
Dura, JAUNSPECIFIEDUNSPECIFIED
Date : September 2004
Identification Number : https://doi.org/10.1002/sia.1909
Depositing User : Symplectic Elements
Date Deposited : 28 Mar 2017 13:14
Last Modified : 28 Mar 2017 13:14
URI: http://epubs.surrey.ac.uk/id/eprint/806536

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