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On fabrication of high concentration Mn doped Si by ion implantation: problem and challenge

Peng, N, Jeynes, C, Gwilliam, RM, Webb, RP, Pan, F and Chen, X (2012) On fabrication of high concentration Mn doped Si by ion implantation: problem and challenge In: 18th International Vacuum Congress (IVC)/International Conference on Nanoscience and Technology (ICNT)/14th International Conference on Surfaces Science (ICSS)/Vacuum and Surface Sciences Conference of Asia and Australia (VASSCAA), 2010-08-23 - 2010-08-27, Beijing, PEOPLES R CHINA.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Peng, NUNSPECIFIEDUNSPECIFIED
Jeynes, CUNSPECIFIEDUNSPECIFIED
Gwilliam, RMUNSPECIFIEDUNSPECIFIED
Webb, RPUNSPECIFIEDUNSPECIFIED
Pan, FUNSPECIFIEDUNSPECIFIED
Chen, XUNSPECIFIEDUNSPECIFIED
Date : 1 January 2012
Identification Number : 10.1016/j.phpro.2012.03.577
Contributors :
ContributionNameEmailORCID
http://www.loc.gov/loc.terms/relators/PBLELSEVIER SCIENCE BV, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Nanoscience & Nanotechnology, Materials Science, Coatings & Films, Physics, Applied, Engineering, Science & Technology - Other Topics, Materials Science, Physics, ion implantation, dilute magnetic semiconducotr, Si, FERROMAGNETISM
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 28 Mar 2017 13:14
Last Modified : 31 Oct 2017 17:06
URI: http://epubs.surrey.ac.uk/id/eprint/806492

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