Fabrication and characterisation of embedded metal nanostructures by ion implantation with nanoporous anodic alumina masks

Guan, W, Ghatak, J, Peng, Y, Bhatta, UM, Inkson, BJ, Möbus, G, Peng, N, Jeynes, C and Ross, IM (2013) Fabrication and characterisation of embedded metal nanostructures by ion implantation with nanoporous anodic alumina masks Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 307. pp. 273-276.

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Abstract

Lateral ordered Co, Pt and Co/Pt nanostructures were fabricated in SiO2 and Si3N4 substrates by high fluence metal ion implantation through periodic nanochannel membrane masks based on anodic aluminium oxides (AAO). The quality of nanopatterning transfer defined by various AAO masks in different substrates was examined by transmission electron microscopy (TEM) in both imaging and spectroscopy modes. © 2013 Elsevier B.V. All rights reserved.

Item Type:	Article
Divisions :	Surrey research (other units)
Authors :	Guan, W, Ghatak, J, Peng, Y, Bhatta, UM, Inkson, BJ, Möbus, G, Peng, N, Jeynes, C and Ross, IM
Date :	15 July 2013
DOI :	10.1016/j.nimb.2013.02.046
Depositing User :	Symplectic Elements
Date Deposited :	28 Mar 2017 13:14
Last Modified :	24 Jan 2020 12:28
URI:	http://epubs.surrey.ac.uk/id/eprint/806483

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