Ion Beam Methods – Introduction

Jeynes, C (2012) Ion Beam Methods – Introduction In: Characterization of Materials. Characterization of Materials, Vol.3: . Wiley, pp. 1941-1948. ISBN 9780471266969

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Abstract

Ion beam techniques are used with ion energies from eV to many MeV and a very wide range of ion species to characterise materials at length scales from sub-nm to sub-mm and in a wide variety of different ways. Many of these techniques are non destructive. Atomic concentration can be determined from matrix elements (the stoichiometry) to minor and trace elements (at ng/g sensitivity and better), in one dimension (depth profiles), two dimensions (elemental maps), and three dimensions with full tomography being feasible. There is sensitivity to the whole Periodic Table one way or another, with nuclear techniques for isotopic sensitivity, and high resolution mass spectrometry for obtaining isotopic ratios at ultra-high sensitivities of 1014 and better. Other techniques include ultra-high resolution microscopy, characterisation of semiconductor device defects at high spacial resolution, and the investigation of damage processes in the nuclear irradiation of materials. ION BEAM METHODS for thin film materials have major application areas from archaeology to zoology (including materials science, geology, cultural heritage, electronics and many others).

Item Type:	Book Section
Divisions :	Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Authors :	Name Email ORCID Jeynes, C
Date :	12 October 2012
Additional Information :	This is the accepted version of the following article: Jeynes, C (2012) Ion Beam Methods – Introduction, in Characterization of Materials Ed. Kaufmann, EN, ISBN: 9780471266969, which has been published in final form at http://dx.doi.org/10.1002/0471266965.com091.pub2
Depositing User :	Symplectic Elements
Date Deposited :	06 Jan 2015 15:24
Last Modified :	31 Oct 2017 16:40
URI:	http://epubs.surrey.ac.uk/id/eprint/805317

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