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Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography

Kyriakou, G, Davis, DJ, Grant, RB, Watson, DJ, Keen, A, Tikhov, MS and Lambert, RM (2007) Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography JOURNAL OF PHYSICAL CHEMISTRY C, 111 (12). pp. 4491-4494.

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Item Type: Article
Authors :
AuthorsEmailORCID
Kyriakou, GUNSPECIFIEDUNSPECIFIED
Davis, DJUNSPECIFIEDUNSPECIFIED
Grant, RBUNSPECIFIEDUNSPECIFIED
Watson, DJUNSPECIFIEDUNSPECIFIED
Keen, AUNSPECIFIEDUNSPECIFIED
Tikhov, MSUNSPECIFIEDUNSPECIFIED
Lambert, RMUNSPECIFIEDUNSPECIFIED
Date : 29 March 2007
Identification Number : https://doi.org/10.1021/jp070485e
Uncontrolled Keywords : Science & Technology, Physical Sciences, Technology, Chemistry, Physical, Nanoscience & Nanotechnology, Materials Science, Multidisciplinary, Chemistry, Science & Technology - Other Topics, Materials Science, SYNCHROTRON RADIATION, CAPPING LAYERS, ULTRAVIOLET, DESORPTION, SURFACES, KINETICS, OPTICS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 28 Mar 2017 13:51
Last Modified : 28 Mar 2017 13:51
URI: http://epubs.surrey.ac.uk/id/eprint/794990

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