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Deactivation of ultrashallow boron implants in preamorphized silicon after nonmelt laser annealing with multiple scans

Sharp, JA, Cowern, NEB, Webb, RP, Kirkby, KJ, Giubertoni, D, Gennaro, S, Bersani, M, Foad, MA, Cristiano, F and Fazzini, PF (2006) Deactivation of ultrashallow boron implants in preamorphized silicon after nonmelt laser annealing with multiple scans APPLIED PHYSICS LETTERS, 89 (19), ARTN 1.

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Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Authors :
AuthorsEmailORCID
Sharp, JAUNSPECIFIEDUNSPECIFIED
Cowern, NEBUNSPECIFIEDUNSPECIFIED
Webb, RPUNSPECIFIEDUNSPECIFIED
Kirkby, KJUNSPECIFIEDUNSPECIFIED
Giubertoni, DUNSPECIFIEDUNSPECIFIED
Gennaro, SUNSPECIFIEDUNSPECIFIED
Bersani, MUNSPECIFIEDUNSPECIFIED
Foad, MAUNSPECIFIEDUNSPECIFIED
Cristiano, FUNSPECIFIEDUNSPECIFIED
Fazzini, PFUNSPECIFIEDUNSPECIFIED
Date : 6 November 2006
Identification Number : 10.1063/1.2385215
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, ULTRA-SHALLOW JUNCTIONS, THERMAL-STABILITY, ACTIVATION, REACTIVATION, PROFILES, DEFECTS, DOPANTS
Related URLs :
Additional Information :

Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

The following article appeared in Applied Physics Letters, 89 (19) 192105 and may be found at J. A. Sharp et al., Appl. Phys.Lett. 89, 192105 (2006)

Depositing User : Mr Adam Field
Date Deposited : 07 Dec 2011 10:56
Last Modified : 06 May 2015 13:33
URI: http://epubs.surrey.ac.uk/id/eprint/7914

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