High speed silicon optical modulator with self aligned fabrication process

Thomson, DJ, Gardes, FY, Reed, GT, Milesi, F and Fedeli, J-M (2010) High speed silicon optical modulator with self aligned fabrication process Optics Express, 18 (18). pp. 19064-19069.

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Abstract

With the imminent commercialisation of silicon photonic devices comes the requirement for a fabrication process capable of high yield and device performance repeatability. The precise alignment of the different elements of a device can be a major fabrication challenge for minimising performance variation or even device failure. In this paper a new design of high speed carrier depletion silicon optical modulator is introduced which features the use of a self-aligned fabrication process to form the pn junction. Experimental results are presented from an initial fabrication run, which has demonstrated a 6dB modulation depth at 10Gbit/s from a 3.5mm long device.

Item Type:	Article
Divisions :	Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Photonics
Authors :	Thomson, DJ, Gardes, FY, Reed, GT, Milesi, F and Fedeli, J-M
Date :	2010
DOI :	10.1364/OE.18.019064
Additional Information :	This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: <a href=http://dx.doi.org/10.1364/OE.18.019064</a>. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
Depositing User :	Symplectic Elements
Date Deposited :	14 Jun 2012 10:18
Last Modified :	31 Oct 2017 14:14
URI:	http://epubs.surrey.ac.uk/id/eprint/7860

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