Highly conductive nanoclustered carbon:nickel films grown by pulsed laser deposition
Jayawardena, KDGI, Tan, YY, Fryar, J, Shiozawa, H, Silva, SRP, Henley, SJ, Fuge, GM, Truscott, BS and Ashfold, MNR (2011) Highly conductive nanoclustered carbon:nickel films grown by pulsed laser deposition Carbon, 49 (12). 3781 - 3788. ISSN 0008-6223
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Official URL: http://dx.doi.org/10.1016/j.carbon.2011.05.012
An enhancement by 5 orders of magnitude of the electrical conductivity of nanoclustered carbon films is reported by incorporation of metallic atoms, but without significant morphological changes. Films were deposited by 248 nm pulsed laser ablation of both a pyrolytic graphite target and a mixed carbon–nickel (C:Ni) target, and structural analysis revealed that similar film morphologies were obtained when deposition was carried out using either target. Compositional analysis demonstrated a preferential incorporation of nickel over carbon in the resulting films (cf. the composition of the target). This non-stoichiometric transfer was also observed for films grown by 193 nm laser ablation of the C:Ni target, for which the enhancement was more pronounced, indicating that the ablation mechanism and the subsequent transfer are important in determining the eventual film composition.
|Additional Information:||NOTICE: this is the author’s version of a work that was accepted for publication in Carbon. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Carbon, 49(12), October 2011, DOI 10.1016/j.carbon.2011.05.012.|
|Divisions:||Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre|
|Deposited By:||Symplectic Elements|
|Deposited On:||01 Dec 2011 13:50|
|Last Modified:||01 Apr 2013 14:49|
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