Efficient coupling of optical energy for rapid catalyzed nanomaterial growth: high-quality carbon nanotube synthesis at low substrate temperatures.
Ahmad, M, Anguita, JV, Stolojan, V, Carey, JD and Silva, SR (2013) Efficient coupling of optical energy for rapid catalyzed nanomaterial growth: high-quality carbon nanotube synthesis at low substrate temperatures. ACS Appl Mater Interfaces, 5 (9). pp. 3861-3866.
Published version ACS AMI 5.pdf
Available under License : See the attached licence file.
The synthesis of high-quality nanomaterials depends on the efficiency of the catalyst and the growth temperature. To produce high-quality material, high-growth temperatures (often up to 1000 °C) are regularly required and this can limit possible applications, especially where temperature sensitive substrates or tight thermal budgets are present. In this study, we show that high-quality catalyzed nanomaterial growth at low substrate temperatures is possible by efficient coupling of energy directly into the catalyst particles by an optical method. We demonstrate that using this photothermal-based chemical vapor deposition method that rapid growth (under 4 min, which includes catalyst pretreatment time) of high-density carbon nanotubes can be grown at substrate temperatures as low as 415 °C with proper catalyst heat treatment. The growth process results in nanotubes that are high quality, as judged by a range of structural, Raman, and electrical characterization techniques, and are compatible with the requirements for interconnect technology.
|Divisions :||Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre|
|Date :||8 May 2013|
|Identification Number :||https://doi.org/10.1021/am400542u|
|Uncontrolled Keywords :||carbon nanotube growth, Raman spectroscopy G peak, Raman spectroscopy D peak, nanomaterial production, high quality carbon nanotubes, photothermal chemical vapour deposition, thermal budgets, catalyst pre-treatments, chemical vapour deposition, thermal barrier layers|
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|Additional Information :||This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Materials and Interfaces, copyright © American Chemical Society after peer review and technical editing by the publisher.To access the final edited and published work see http://dx.doi.org/10.1021/am400542u.|
|Depositing User :||Symplectic Elements|
|Date Deposited :||02 Apr 2014 11:25|
|Last Modified :||09 Jun 2014 13:51|
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