Remote plasma sputtering of indium tin oxide thin films for large area flexible electronics
Yeadon, AD, Wakeham, SJ, Brown, HL, Thwaites, MJ, Whiting, MJ and Baker, MA (2011) Remote plasma sputtering of indium tin oxide thin films for large area flexible electronics Thin Solid Films, 520 (4). 1207 - 1211. ISSN 0040-6090
Remote plasma sputtering of indium tin oxide thin ﬁlms for large area ﬂexible electronics 20111106.pdf - Accepted Version
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Indium tin oxide (ITO) thin films with a specific resistivity of 3.5 × 10− 4 Ω cm and average visible light transmission (VLT) of 90% have been reactively sputtered onto A4 Polyethylene terephthalate (PET), glass and silicon substrates using a remote plasma sputtering system. This system offers independent control of the plasma density and the target power enabling the effect of the plasma on ITO properties to be studied. Characterization of ITO on glass and silicon has shown that increasing the plasma density gives rise to a decrease in the specific resistivity and an increase in the optical band gap of the ITO films. Samples deposited at plasma powers of 1.5 kW, 2.0 kW and 2.5 kW and optimized oxygen flow rates exhibited specific resistivity values of 3.8 × 10− 4 Ω cm, 3.7 × 10− 4 Ω cm and 3.5 × 10− 4 Ω cm and optical gaps of 3.48 eV, 3.51 eV and 3.78 eV respectively. The increase in plasma density also influenced the crystalline texture and the VLT increased from 70 to 95%, indicating that more oxygen is being incorporated into the growing film. It has been shown that the remote plasma sputter technique can be used in an in-line process to produce uniform ITO coatings on PET with specific resistivities of between 3.5 × 10− 4 and 4.5 × 10− 4 Ω cm and optical transmission of greater than 85% over substrate widths of up to 30 cm.
|Additional Information:||NOTICE: this is the author’s version of a work that was accepted for publication in Thin Solid Films. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Thin Solid Films, 520(4), December 2011, DOI 10.1016/j.tsf.2011.07.072.|
|Divisions:||Faculty of Engineering and Physical Sciences > Mechanical Engineering Sciences|
|Depositing User:||Symplectic Elements|
|Date Deposited:||07 Dec 2011 12:08|
|Last Modified:||23 Sep 2013 18:49|
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