Formation of carbon nitride compounds during successive implantations in copper
Thomé, T, Colaux, JL, Terwagne, G and Louette, P (2006) Formation of carbon nitride compounds during successive implantations in copper Journal of Electron Spectroscopy and Related Phenomena, 151 (1). pp. 19-23.
Formation of carbon nitride compounds during successive implantation in copper.pdf
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Copper substrates are successively implanted with carbon and nitrogen (C and N) at high fluences (5 × 10 and 1 × 10 at. cm, respectively) in order to synthesize specific carbon nitride compounds. The concentration as well as the depth distribution of carbon C and nitrogen N are determined using non resonant nuclear reactions induced by a 1.05 MeV deuteron beam. The use of (d,p) and (d,α) reactions allows us to profile both C and N elements with a single and relatively rapid measurement and a quite good resolution. The bonded states of carbon and nitrogen are studied as a function of depth by X-ray photoelectron spectroscopy (XPS). The curve fitting of the C 1s and N 1s photopeaks shows that carbon and nitrogen atoms exist in different chemical states depending on the analysis depth, which correspond to specific kinds of chemical bonds. At least two characteristic C-N bonds are detected indicating that different carbon nitride compounds have been formed during the implantations. © 2005 Elsevier B.V. All rights reserved.
|Divisions :||Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre|
|Date :||March 2006|
|Identification Number :||10.1016/j.elspec.2005.10.001|
|Additional Information :||NOTICE: this is the author’s version of a work that was accepted for publication in Journal of Electron Spectroscopy and Related Phenomena. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Journal of Electron Spectroscopy and Related Phenomena, 151(1), March 2006, DOI 10.1016/j.elspec.2005.10.001.|
|Depositing User :||Symplectic Elements|
|Date Deposited :||20 Mar 2013 14:53|
|Last Modified :||23 Sep 2013 19:58|
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