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Excimer laser nanostructuring of nickel thin films for the catalytic growth of carbon nanotubes

Henley, SJ, Poa, CHP, Adikaari, AADT, Giusca, CE, Carey, JD and Silva, SRP (2004) Excimer laser nanostructuring of nickel thin films for the catalytic growth of carbon nanotubes APPLIED PHYSICS LETTERS, 84 (20). pp. 4035-4037.

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Abstract

The catalytic growth of carbon nanotubes by excimer laser nanostructuring (LN) of nickel films was investigated. The thin films were first deposited by pulsed laser ablation (PLA). The plasma enhanced chemical vapor deposition (PECVD) was used to grow the multiwall carbon nanotubes. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) were used for the study of the films. It was observed that the combination of excimer laser growth and LN of Ni films was useful for the preparation of substrates with well-defined, discrete, nano-scale catalyst particles.

Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Authors :
AuthorsEmailORCID
Henley, SJUNSPECIFIEDUNSPECIFIED
Poa, CHPUNSPECIFIEDUNSPECIFIED
Adikaari, AADTUNSPECIFIEDUNSPECIFIED
Giusca, CEUNSPECIFIEDUNSPECIFIED
Carey, JDUNSPECIFIEDUNSPECIFIED
Silva, SRPUNSPECIFIEDUNSPECIFIED
Date : 17 May 2004
Identification Number : 10.1063/1.1751226
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, CHEMICAL-VAPOR-DEPOSITION, TEMPERATURE
Related URLs :
Additional Information :

Copyright 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

The following article appeared in Applied Physics Letters, 84 (20) and may be found at http://dx.doi.org/10.1063/1.1751226

Depositing User : Symplectic Elements
Date Deposited : 28 Jan 2013 10:30
Last Modified : 09 Jun 2014 13:35
URI: http://epubs.surrey.ac.uk/id/eprint/745624

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