Excimer laser nanostructuring of nickel thin films for the catalytic growth of carbon nanotubes
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Henley, SJ, Poa, CHP, Adikaari, AADT, Giusca, CE, Carey, JD and Silva, SRP (2004) Excimer laser nanostructuring of nickel thin films for the catalytic growth of carbon nanotubes APPLIED PHYSICS LETTERS, 84 (20). pp. 4035-4037.
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Official URL: http://dx.doi.org/10.1063/1.1751226
Abstract
The catalytic growth of carbon nanotubes by excimer laser nanostructuring (LN) of nickel films was investigated. The thin films were first deposited by pulsed laser ablation (PLA). The plasma enhanced chemical vapor deposition (PECVD) was used to grow the multiwall carbon nanotubes. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) were used for the study of the films. It was observed that the combination of excimer laser growth and LN of Ni films was useful for the preparation of substrates with well-defined, discrete, nano-scale catalyst particles.
| Item Type: | Article |
|---|---|
| Divisions : | Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre |
| Authors : | Henley, SJ, Poa, CHP, Adikaari, AADT, Giusca, CE, Carey, JD and Silva, SRP |
| Date : | 17 May 2004 |
| DOI : | 10.1063/1.1751226 |
| Uncontrolled Keywords : | Science & Technology, Physical Sciences, Physics, Applied, Physics, CHEMICAL-VAPOR-DEPOSITION, TEMPERATURE |
| Related URLs : | |
| Additional Information : |
Copyright 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters, 84 (20) and may be found at http://dx.doi.org/10.1063/1.1751226 |
| Depositing User : | Symplectic Elements |
| Date Deposited : | 28 Jan 2013 10:30 |
| Last Modified : | 31 Oct 2017 14:56 |
| URI: | http://epubs.surrey.ac.uk/id/eprint/745624 |
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