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Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition

Miyajima, Y, Henley, SJ and Silva, SRP (2011) Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition THIN SOLID FILMS, 519 (19). pp. 6374-6380.

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Item Type: Article
Authors :
NameEmailORCID
Miyajima, YUNSPECIFIEDUNSPECIFIED
Henley, SJUNSPECIFIEDUNSPECIFIED
Silva, SRPUNSPECIFIEDUNSPECIFIED
Date : 29 July 2011
Identification Number : 10.1016/j.tsf.2011.04.040
Uncontrolled Keywords : Amorphous carbon, Plasma-enhanced chemical vapor deposition, Carbon nitride, Optical transmittance
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 28 Mar 2017 14:12
Last Modified : 31 Oct 2017 14:50
URI: http://epubs.surrey.ac.uk/id/eprint/735952

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