Inverted method for fabricating a nano-aperture device with subwavelength structures
Suutala, A, Olkkonen, J, Cox, DC, Lappalainen, J and Jantunen, H (2009) Inverted method for fabricating a nano-aperture device with subwavelength structures JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 27 (6). pp. 2457-2461.
Available under License : See the attached licence file.
|Divisions :||Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre|
|Date :||1 November 2009|
|Identification Number :||https://doi.org/10.1116/1.3263225|
|Uncontrolled Keywords :||Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Nanoscience & Nanotechnology, Physics, Applied, Engineering, Science & Technology - Other Topics, Physics, aluminium, atomic force microscopy, electron beam deposition, focused ion beam technology, nanopatterning, nanostructured materials, organic compounds, plasmonics, scanning electron microscopy, ENHANCED LIGHT TRANSMISSION, OPTICAL-TRANSMISSION, HOLE ARRAYS, SURFACE, CORRUGATIONS|
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|Additional Information :||Copyright 2009 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Vacuum Science & Technology B, 27 (6) and may be found at http://dx.doi.org/10.1116/1.3263225|
|Depositing User :||Symplectic Elements|
|Date Deposited :||30 Nov 2012 11:03|
|Last Modified :||23 Sep 2013 19:49|
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