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Strain engineering of the electroabsorption response in Ge/SiGe multiple quantum well heterostructures

Lever, L, Hu, Y, Myronov, M, Liu, X, Owens, N, Gardes, FY, Marko, IP, Sweeney, SJ, Ikonić, Z, Leadley, DR, Reed, GT and Kelsall, RW (2011) Strain engineering of the electroabsorption response in Ge/SiGe multiple quantum well heterostructures In: Group IV Photonics, 2011-09-14 - 2011-09-16, London, UK.

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Abstract

Many fibre-optic telecommunications systems exploit the spectral `window' at 1310 nm, which corresponds to zero dispersion in standard single-mode fibres (SMFs). In particular, several passive optical network (PON) architectures use 1310 nm for upstream signals,1 and so compact, low-cost and low-power modulators operating at 1310 nm that can be integrated into Si electronic-photonic integrated circuits would be extremely desireable for future fibre-to-the-home (FTTH) applications.

Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
AuthorsEmailORCID
Lever, LUNSPECIFIEDUNSPECIFIED
Hu, YUNSPECIFIEDUNSPECIFIED
Myronov, MUNSPECIFIEDUNSPECIFIED
Liu, XUNSPECIFIEDUNSPECIFIED
Owens, NUNSPECIFIEDUNSPECIFIED
Gardes, FYUNSPECIFIEDUNSPECIFIED
Marko, IPUNSPECIFIEDUNSPECIFIED
Sweeney, SJUNSPECIFIEDUNSPECIFIED
Ikonić, ZUNSPECIFIEDUNSPECIFIED
Leadley, DRUNSPECIFIEDUNSPECIFIED
Reed, GTUNSPECIFIEDUNSPECIFIED
Kelsall, RWUNSPECIFIEDUNSPECIFIED
Date : 2011
Identification Number : https://doi.org/10.1109/GROUP4.2011.6053731
Contributors :
ContributionNameEmailORCID
PublisherIEEE, UNSPECIFIEDUNSPECIFIED
Depositing User : Symplectic Elements
Date Deposited : 28 Mar 2017 14:11
Last Modified : 28 Mar 2017 14:11
URI: http://epubs.surrey.ac.uk/id/eprint/733173

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