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Pitfalls in Ion Beam Analysis

Jeynes, C and Barradas, NP (2009) Pitfalls in Ion Beam Analysis In: Handbook of Modern Ion Beam Materials Analysis. Materials Research Society, Warrendale Pennsylvania, 347 - 383. ISBN 1605112151

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Accurate elemental depth profiling by IBA is of great value to many modern thin-film technologies. IBA is a quantitative analytical technique now capable of traceable accuracy below 1%. In this chapter we describe sources of errors in data collection and analysis (pitfalls) greater than about 1/4%.

Item Type: Book Section
Uncontrolled Keywords: Science, Accelerators, Analytical methods, Rutherford backscattering spectrometry, Thin film depth profiling
Related URLs:
Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Depositing User: Symplectic Elements
Date Deposited: 26 Oct 2012 08:48
Last Modified: 23 Sep 2013 19:37

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