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Pitfalls in Ion Beam Analysis

Jeynes, C and Barradas, NP (2009) Pitfalls in Ion Beam Analysis In: Handbook of Modern Ion Beam Materials Analysis. Materials Research Society, Warrendale Pennsylvania, pp. 347-383. ISBN 1605112151

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Accurate elemental depth profiling by IBA is of great value to many modern thin-film technologies. IBA is a quantitative analytical technique now capable of traceable accuracy below 1%. In this chapter we describe sources of errors in data collection and analysis (pitfalls) greater than about 1/4%.

Item Type: Book Section
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Authors :
Jeynes, C
Barradas, NP
Editors :
Wang, Y
Nastasi, MA
Date : December 2009
Uncontrolled Keywords : Science, Accelerators, Analytical methods, Rutherford backscattering spectrometry, Thin film depth profiling
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 26 Oct 2012 08:48
Last Modified : 31 Oct 2017 14:42

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