Pitfalls in Ion Beam Analysis
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Jeynes, C and Barradas, NP (2009) Pitfalls in Ion Beam Analysis In: Handbook of Modern Ion Beam Materials Analysis. Materials Research Society, Warrendale Pennsylvania, 347 - 383. ISBN 1605112151
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Abstract
Accurate elemental depth profiling by IBA is of great value to many modern thin-film technologies. IBA is a quantitative analytical technique now capable of traceable accuracy below 1%. In this chapter we describe sources of errors in data collection and analysis (pitfalls) greater than about 1/4%.
| Item Type: | Book Section |
|---|---|
| Uncontrolled Keywords: | Science, Accelerators, Analytical methods, Rutherford backscattering spectrometry, Thin film depth profiling |
| Divisions: | Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre |
| Related URLs: | |
| ID Code: | 715433 |
| Deposited By: | Symplectic Elements |
| Deposited On: | 26 Oct 2012 09:48 |
| Last Modified: | 24 Jan 2013 09:40 |
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