Freestanding waveguides in silicon
Yang, PY, Mashanovich, GZ, Gomez-Morilla, I, Headley, WR, Reed, GT, Teo, EJ, Blackwood, DJ, Breese, MBH and Bettiol, AA (2007) Freestanding waveguides in silicon Applied Physics Letters, 90 (24). ISSN 0003-6951
|PDF - Published Version |
Available under License : See the attached licence file.
|Plain Text (licence)|
Official URL: http://dx.doi.org/10.1063/1.2749175
Using a direct-write process for the production of three dimensional microstructures on a semiconductor, freestanding waveguides have been realized in silicon. The waveguides are produced by a focused beam of high energy protons that is scanned over a silicon substrate. The latent image of the scan is subsequently developed by electrochemical etching. Herein the authors report on the fabrication method as well as determining the propagation loss of these structures. Propagation loss values of 13.4 and 14.6 dB/cm were obtained for these preliminary structures for transverse electric and transverse magnetic polarizations, respectively.
|Divisions:||Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Photonics|
|Deposited By:||Mr Adam Field|
|Deposited On:||14 Sep 2011 12:12|
|Last Modified:||08 Jun 2013 15:47|
Repository Staff Only: item control page