Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation
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Teo, EJ, Bettiol, AA, Yang, P, Breese, MBH, Xiong, BQ, Mashanovich, GZ, Headley, WR and Reed, GT (2009) Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation OPT LETT, 34 (5). 659 - 661. ISSN 0146-9592
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Official URL: http://dx.doi.org/10.1364/OL.34.000659
Abstract
we have successfully fabricated low-loss silicon-on-oxidized-porous-silicon (SOPS) strip waveguides with high-index contrast using focused proton-beam irradiation and electrochemical etching. Smooth surface quality with rms roughness of 3.1 nm is achieved for a fluence of 1 x 10(15)/cm(2) after postoxidation treatment. Optical characterization at a wavelength of 1550 nm shows a loss of 1.1 +/- 0.4 dB/cm and 1.2 +/- 0.4 dB/cm in TE and TM polarization respectively, which we believe is the lowest reported loss for SOPS waveguides. This opens up new opportunities for all-silicon-based optoelectronics applications. (C) 2009 Optical Society of America
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | ROUGHNESS |
| Divisions: | Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Photonics |
| ID Code: | 7091 |
| Deposited By: | Symplectic Elements |
| Deposited On: | 30 Aug 2011 13:31 |
| Last Modified: | 08 Jun 2013 15:41 |
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