Determination of the deposition order of overlapping latent fingerprints and inks using Secondary Ion Mass Spectrometry (SIMS).
Bright, NJ, Webb, R, Hinder, SJ, Kirkby, KJ, Ward, NI, Watts, JF, Bleay, S and Bailey, MJ (2012) Determination of the deposition order of overlapping latent fingerprints and inks using Secondary Ion Mass Spectrometry (SIMS). Anal Chem, 84 (9). 4083 - 4087. ISSN 0003-2700
Available under License : See the attached licence file.
A new protocol using time-of-flight secondary ion mass spectrometry (ToF-SIMS) has been developed to identify the deposition order of a fingerprint overlapping an ink line on paper. By taking line scans of fragment ions characteristic of the ink molecules (m/z 358.2 and 372.2) where the fingerprint and ink overlap and by calculating the normalised standard deviation of the intensity variation across the line scan, it is possible to determine whether or not a fingerprint is above ink on a paper substrate. The protocol adopted works for a selection of fingerprints from four donors tested here and for a fingerprint that was aged for six months; for one donor, the very faint fingerprints could not be visualized using either standard procedures (ninhydrin development) or SIMS and therefore the protocol correctly gives an inconclusive result.
|Additional Information:||This document is the Accepted Manuscript version of a Published Work that appeared in final form in Analytical Chemistry, copyright © American Chemical Society after peer review and technical editing by the publisher.To access the final edited and published work see http://dx.doi.org/10.1021/ac300185j.|
|Divisions:||Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre|
|Depositing User:||Symplectic Elements|
|Date Deposited:||01 Aug 2012 12:57|
|Last Modified:||07 Jan 2014 15:18|
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