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Excimer Laser Nanostructuring of Nickel Thin Films for the Catalytic Growth of Carbon Nanotubes

Henley, S J, Poa, C H, Adikaari, A A, Giusca, C E, Carey, JD and Silva, S R (2004) Excimer Laser Nanostructuring of Nickel Thin Films for the Catalytic Growth of Carbon Nanotubes Applied Physics Letters, 84 (20). ISSN 00036951

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Abstract

Pulse laser ablation and subsequent laser nanostructuring at room temperature has been employed to produce nanostructured Ni on SiO2/Si substrates for catalytic growth of carbon nanotubes. The resultant nanostructured surface is seen to consist of nanometer sized hemispherical droplets whose mean diameter is controlled by the initial metal thickness, which in turn is readily controlled by the number of laser pulses. Vertically aligned multiwall carbon nanotube mats were then grown using conventional plasma enhanced chemical vapor deposition. We show that within a single processing technique it is possible to produce the initial metal-on-oxide thin film to a chosen thickness but also to be able to alter the morphology of the film to desired specifications at low macroscopic temperatures using the laser parameters. The influence of the underlying oxide is also explored to explain the mechanism of nanostructuring of the Ni catalyst. (C) 2004 American Institute of Physics.

Item Type: Article
Additional Information: Published in <i>Applied Physics Letters,</i> Vol. 84, Iss. 20. Copyright 2004 American Institute of Physics Click <a href=http://apl.aip.org/>here</a> to access the journal's website.
Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Depositing User: Mr Adam Field
Date Deposited: 27 May 2010 14:09
Last Modified: 23 Sep 2013 18:28
URI: http://epubs.surrey.ac.uk/id/eprint/475

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