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Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

Zeze, DA, Cox, DC, Weiss, BL and Silva, SRP (2004) Lithography-free high aspect ratio submicron quartz columns by reactive ion etching APPLIED PHYSICS LETTERS, 84 (8). 1362 - 1364. ISSN 0003-6951

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Abstract

We describe lithography-free fabrication of sub-micron surface features on quartz substrates by the reactive ion etching (RIE) in a CF4/Ar atmosphere. These submicron glass columns are well defined, have a high aspect ratio, with the underlying substrate being very flat. The geometry of the fabricated surface columns is dependent on the RIE process parameters. The analysis of these glass columns shows that a differential etching process takes place. The optical characterization of these samples shows a significant absorption at visible wavelengths whereas the relative transmission is very high in the infrared range, suggesting that these samples could potentially be used for wavelength selection device applications.

Item Type: Article
Uncontrolled Keywords: Science & Technology, Physical Sciences, Physics, Applied, Physics
Related URLs:
Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Depositing User: Mr Adam Field
Date Deposited: 27 May 2010 14:09
Last Modified: 23 Sep 2013 18:28
URI: http://epubs.surrey.ac.uk/id/eprint/468

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