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Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

Zeze, DA, Cox, DC, Weiss, BL and Silva, SRP (2004) Lithography-free high aspect ratio submicron quartz columns by reactive ion etching APPLIED PHYSICS LETTERS, 84 (8). 1362 - 1364. ISSN 0003-6951

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Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Authors :
AuthorsEmail
Zeze, DAUNSPECIFIED
Cox, DCUNSPECIFIED
Weiss, BLUNSPECIFIED
Silva, SRPUNSPECIFIED
Date : 23 February 2004
Identification Number : 10.1063/1.1647280
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED
Related URLs :
Depositing User : Mr Adam Field
Date Deposited : 27 May 2010 14:09
Last Modified : 17 Jan 2015 14:54
URI: http://epubs.surrey.ac.uk/id/eprint/468

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