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Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

Zeze, DA, Cox, DC, Weiss, BL and Silva, SRP (2004) Lithography-free high aspect ratio submicron quartz columns by reactive ion etching APPLIED PHYSICS LETTERS, 84 (8). 1362 - 1364. ISSN 0003-6951

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Item Type: Article
Uncontrolled Keywords: Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED
Related URLs:
Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Depositing User: Mr Adam Field
Date Deposited: 27 May 2010 14:09
Last Modified: 09 Jun 2014 13:28
URI: http://epubs.surrey.ac.uk/id/eprint/468

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